In the semiconductor process, neon can be used for KrF and ArF laser exposure. Among the argon/fluorine/neon gases used in ArF excimer lasers, krypton is also used in the photolithography process, and xenon is used in the semiconductor etching process.
The industry media Jiwei.com once pointed out that neon is the main component of lithography gas.
Among the argon/fluorine/neon gases used in ArF excimer lasers, neon accounts for more than 96% of the gas mixture composition. Relevant processes cover the process nodes from 180nm for 8-inch wafers to 1Xnm for 12 inch wafers, and 75% of the global wafer foundry capacity is located in this process range.
It is worth noting that the product categories, such as power management chips, RF chips, MCU, IGBT power semiconductors, which are extremely scarce at present, fall within the above process range.
In the semiconductor process, neon can be used for KrF and ArF laser exposure. Among the argon/fluorine/neon gases used in ArF excimer lasers, krypton is also used in the photolithography process, and xenon is used in the semiconductor etching process.
The industry media Jiwei.com once pointed out that neon is the main component of lithography gas.
Among the argon/fluorine/neon gases used in ArF excimer lasers, neon accounts for more than 96% of the gas mixture composition. Relevant processes cover the process nodes from 180nm for 8-inch wafers to 1Xnm for 12 inch wafers, and 75% of the global wafer foundry capacity is located in this process range.
It is worth noting that the product categories, such as power management chips, RF chips, MCU, IGBT power semiconductors, which are extremely scarce at present, fall within the above process range.
